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In situ modification of cell-culture scaffolds by photocatalysis of visible-light-responsive TiO_2 film

机译:可见光响应TiO_2薄膜的光催化原位修饰细胞培养支架

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摘要

We propose a novel process to modify the cell affinity of scaffolds in a cell-culture environment using the photocatalytic activity of visible-light (VL)-responsive TiO2. The proposed process is the improved version of our previous demonstration in which ultraviolet (UV)-responsive TiO2 was utilized. In that demonstration, we showed that cell-repellent molecules on TiO2 were decomposed and replaced with cell-permissive molecules upon UV exposure in the medium where cells are being cultured. However, UV irradiation involves taking the risk of inducing damage to the cells. In this work, a TiO2 film was sputter-deposited on a quartz coverslip at 640 degrees C without O-2 gas injection to create a rutile structure containing oxygen defects, which is known to exhibit photocatalytic activity upon VL exposure. We show that the cell adhesion site and migration area can be controlled with the photocatalytic activity of the VL-responsive TiO2 film, while the cellular oxidative stress is reduced markedly by the substitution of VL for UV. (c) 2018 The Japan Society of Applied Physics
机译:我们提出了一种使用可见光(VL)响应TiO2的光催化活性来修改细胞培养环境中支架的细胞亲和力的新方法。所提出的方法是我们先前的演示的改进版本,其中利用了对紫外线(UV)敏感的TiO2。在该演示中,我们显示了在培养细胞的培养基中,紫外线照射下,TiO2上的细胞排斥分子被分解并被细胞允许分子取代。然而,紫外线辐射涉及冒险引起细胞损伤。在这项工作中,在不注入O-2气体的情况下,在640摄氏度下将TiO2薄膜溅射沉积在石英盖玻片上,以创建含有氧缺陷的金红石结构,已知该结构在VL暴露下具有光催化活性。我们表明,细胞粘附位点和迁移区域可以通过VL反应性TiO2薄膜的光催化活性来控制,而细胞氧化应激通过用VL取代UV显着降低。 (c)2018年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第2期|027001.1-027001.5|共5页
  • 作者单位

    Waseda Univ, Sch Fundamental Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan;

    Waseda Univ, Sch Fundamental Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan;

    Waseda Univ, Sch Fundamental Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan;

    Waseda Univ, Sch Fundamental Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan;

    Tohoku Univ, Frontier Res Inst Interdisciplinary Sci, Sendai, Miyagi 9808578, Japan;

    Tohoku Univ, Adv Inst Mat Res, Sendai, Miyagi 9808577, Japan;

    Waseda Univ, Sch Fundamental Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan;

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