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The Effect of Silicon on the High Temperature Oxidation Behavior of Low-carbon Steels Containing the Residual Elements Copper and Nickel

机译:硅对含有残留铜和镍的低碳钢的高温氧化行为的影响

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This study investigates effects of silicon on copper- and nickel-rich phases during the oxidation of iron-based alloys containing 0.3 wt% copper and 0.3 wt% copper +0.15 wt% nickel in addition to steel samples containing various amounts of copper (0.17-0.41 wt%), nickel (0.03-0.13 wt%), and silicon (0.03-0.12 wt%). Samples were exposed to air at 1 150℃ for 60, 300, and 600 s. A low-carbon steel sample (0.02 wt% silicon) without copper and nickel was subjected to the same conditions for comparison.rnThe oxidation rates of copper- and nickel-containing steels decreased with time and were consistently lower than the rate of the residual-free low-carbon steel. An internal oxide layer was observed only in the copper- and nickel-containing steels. The number of internal oxides in this layer increased with oxidation time and larger internal oxides in this layer were characterized to be rich in iron and silicon. Compared to the iron-copper-nickel alloy, steels containing copper, nickel, and silicon, had more copper-, nickel-rich material found as particles entrapped in the oxide.rnIt is proposed that the population of internal silica particles increases due to increasing oxygen content near the oxide/metal interface. The rise in oxygen content results from increased oxygen solubility caused by copper and nickel enrichment. These internal oxides decrease oxidation rate and assist occlusion. An increase by a factor of 10 in amount of occluded material was measured in material containing copper, nickel and silicon compared to copper and nickel.
机译:这项研究调查了在含有0.3%(铜)和0.3%(%)铜+0.15 wt%(镍)的铁基合金的氧化过程中,硅对富铜和富镍相的影响。 0.41重量%),镍(0.03-0.13重量%)和硅(0.03-0.12重量%)。样品在1 150℃的空气中暴露60、300和600 s。将不含铜和镍的低碳钢样品(硅含量为0.02 wt%)进行比较,以进行比较。rn含铜和镍的钢的氧化速率随时间降低,并且始终低于残余铜的氧化速率。不含低碳钢。仅在含铜和镍的钢中观察到内部氧化物层。该层中的内部氧化物的数量随氧化时间而增加,并且该层中较大的内部氧化物的特征是富含铁和硅。与铁铜镍合金相比,包含铜,镍和硅的钢具有更多的富含铜,镍的材料,它们被夹带在氧化物中.rn建议内部二氧化硅颗粒的数量由于增加而增加氧化物/金属界面附近的氧含量。氧含量的增加是由于铜和镍富集引起的氧溶解度增加。这些内部氧化物会降低氧化速率并有助于阻塞。与铜和镍相比,含铜,镍和硅的材料中被测材料的吸留量增加了10倍。

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