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Characterisation of PVD-TiN Coated Austempered Ductile Iron: Effects of Nodule Count and Austempering Temperature

机译:PVD-TiN涂层奥氏体球墨铸铁的表征:根瘤数和奥氏体温度的影响

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摘要

In this work PVD-TiN coatings are deposited on ADI substrates austempered at 280 and 360°C, with nodule counts varying between 490 and 1 100 nod/mm~2. The deposition is performed at 300°C by the arc ion plating technique. The effects of the substrates' microstructure on the characteristics of the coatings and the possible changes in ausferritic microstructure owing to the effects of the deposition process are evaluated. The existing phases, preferred orientation, film thickness, hardness, Young's modulus, surface topography and adhesion of each coated sample are determined. A metallographic characterisation of the ausferritic matrices and determination of the retained austenite content are performed before and after deposition. The results obtained indicate that PVD-TiN coatings feature a preferred orientation of (111) planes parallel to the surface and film thicknesses of about 2μm. Knoop hardness is influenced by the substrates characteristics, the values range from 1 700 to 2100HK_(00l5). Nanohardness values are close to 25GPa, while Young's modulus shows some scattering (323 to 336 GPa). The surface topography is dependent on the microstructure of the substrates and the surface preparation method employed as well as on the deposition process used. The adhesion strength quality of the coatings, according to the Rockwell-C adhesion test, can be related to HF1-HF2 and is affected neither by the hardness differences between the different substrates nor by the nodule count variation. After the coating process, the microstructure of ADI substrates only suffers negligible changes and the amount of retained austenite decreases slightly.
机译:在这项工作中,将PVD-TiN涂层沉积在温度为280和360°C的ADI基板上,其结节数在490和1100 nod / mm〜2之间变化。通过电弧离子镀技术在300℃下进行沉积。评估了基材的微观结构对涂层特性的影响以及由于沉积过程的影响而导致的奥氏体微观结构的变化。确定每个涂覆样品的现有相,优选的取向,膜厚度,硬度,杨氏模量,表面形貌和粘附力。在沉积之前和之后,进行奥氏体基体的金相表征和残留奥氏体含量的测定。获得的结果表明,PVD-TiN涂层的特征是平行于表面的(111)平面的首选方向和约2μm的膜厚。努氏硬度受基材特性的影响,其值的范围为1700至2100HK_(00l5)。纳米硬度值接近25GPa,而杨氏模量显示出一些散射(323至336 GPa)。表面形貌取决于基底的微结构和所使用的表面制备方法以及所使用的沉积工艺。根据Rockwell-C附着力测试,涂层的附着强度质量可能与HF1-HF2有关,并且不受不同基材之间的硬度差异或结节数量变化的影响。涂覆过程之后,ADI基板的微观结构仅发生微不足道的变化,残余奥氏体的量略有减少。

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  • 来源
    《ISIJ international》 |2011年第3期|p.448-455|共8页
  • 作者单位

    Mechanical Technology Group, School of Engineering-Universidad Nacional de Mar del Plata, 4302 J.B. Justo Av.,(B7608FDQ) Mar del Plata, Argentina. , Metallurgy Division, INTEMA-CONICET School of Engineering-Universidad Nacional de Mar del Plata, 4302 J.B. Justo Av., (B7608FDQ) Mar del Plata, Argentina.;

    Mechanical Technology Group, School of Engineering-Universidad Nacional de Mar del Plata, 4302 J.B. Justo Av.,(B7608FDQ) Mar del Plata, Argentina.;

    Mechanical Technology Group, School of Engineering-Universidad Nacional de Mar del Plata, 4302 J.B. Justo Av.,(B7608FDQ) Mar del Plata, Argentina. , Metallurgy Division, INTEMA-CONICET School of Engineering-Universidad Nacional de Mar del Plata, 4302 J.B. Justo Av., (B7608FDQ) Mar del Plata, Argentina.;

    Metallurgy Division, INTEMA-CONICET School of Engineering-Universidad Nacional de Mar del Plata, 4302 J.B. Justo Av., (B7608FDQ) Mar del Plata, Argentina.;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    austempered ductile iron; physical vapour deposition; TiN coatings; adhesion;

    机译:奥氏体球墨铸铁;物理气相沉积;TiN涂层;附着力;
  • 入库时间 2022-08-18 00:02:53

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