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A comprehensive analysis of improving the conforming rate of colour-filter manufacturing processes using Six Sigma

机译:使用六西格码提高滤色片制造工艺合格率的综合分析

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摘要

This research is to apply the Six Sigma define, measure, analyse, improve, and control (DMAIC) approach to reduce the defects of colour filters (CFs) of TFT-LCDs and colour STN-LCDs with respect to a key quality characteristic of gravitation and circumferential colour difference (GCCD), and hence improve their process yield. Since most of the CFs' defects are reported from imperfection of the GCCD, a crucial process called the photo spacer (PS) manufacturing process is first defined, which influences the final result of the GCCD. Secondly, the measurement systems are measured to ensure their accuracy. The determinants resulting in imperfection of GCCD are very complicated, therefore we further analyse the factors that lead to such defects and apply design-of-experiment techniques to acquire the optimal combination of the key factors in the PS process. Lastly, the defects regarding the GCCD in the CFs are proved to be greatly reduced as these key factors are controlled in the optimal setting. The result of this research shows that by applying the Six Sigma DMAIC technique the conforming rate of CFs in the PS manufacturing process can be increased so as to improve the quality of TFT-LCDs and colour STN-LCDs.
机译:这项研究将应用六西格码定义,测量,分析,改进和控制(DMAIC)方法,以减少TFT-LCD和彩色STN-LCD的滤色器(CF)关于重力的关键质量特征的缺陷和周向色差(GCCD),从而提高其工艺良率。由于大多数CF的缺陷都是由GCCD的缺陷引起的,因此首先定义了一个关键过程,即光电间隔物(PS)制造过程,这会影响GCCD的最终结果。其次,对测量系统进行测量以确保其准确性。导致GCCD缺陷的决定因素非常复杂,因此我们进一步分析导致此类缺陷的因素,并应用实验设计技术来获得PS过程中关键因素的最佳组合。最后,事实证明,由于将这些关键因素控制在最佳设置下,CF中有关GCCD的缺陷已大大减少。研究结果表明,通过采用六西格玛DMAIC技术,可以提高PS制造过程中CF的合格率,从而提高TFT-LCD和彩色STN-LCD的质量。

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