首页> 外文期刊>International journal of hydrogen energy >Electrochemical behavior of M_(x-1)O_x (M = Ti, Ge and Co) ultra-thin protective layers for MCFC cathode
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Electrochemical behavior of M_(x-1)O_x (M = Ti, Ge and Co) ultra-thin protective layers for MCFC cathode

机译:MCFC阴极M_(x-1)O_x(M = Ti,Ge和Co)超薄保护层的电化学行为

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摘要

In the world of alternative energy sources, the Molten Carbonate Fuel Cell (MCFC) is one of the promising technologies for the efficient conversion of hydrogen or hydrocarbons to power and heat. One of the main issues for optimizing this device is the control of the dissolution of the state-of-the-art porous nickel oxide cathode. A protective coating by more stable metal oxides seems to be one of the best solutions. In this paper, ultra-thin layers of TiO_2 (50 nm), Co_3O_4 (50 nm) and CeO_2 (20 nm) were deposited on porous nickel substrates, by a sequential CVD technique, known as Atomic Layer Deposition (ALD), producing high quality, homogeneous and conformal layers. The electrochemical behavior and morphological features of the three coated samples were compared in a Li_2CO_3-K_2CO_3 (62-38 mol%) eutectic melt under a standard cathode atmosphere (CO_2/air 30:70 vol%) for 230 h. Finally, the respective advantages and drawbacks of CO_3O_4, TiO_2 and CeO_2 coatings are pointed out.
机译:在替代能源的世界中​​,熔融碳酸盐燃料电池(MCFC)是将氢或碳氢化合物有效转化为动力和热能的有前途的技术之一。优化该装置的主要问题之一是控制最新型多孔氧化镍阴极的溶解。由更稳定的金属氧化物制成的保护涂层似乎是最好的解决方案之一。在本文中,通过称为原子层沉积(ALD)的连续CVD技术,在多孔镍基板上沉积了TiO_2(50 nm),Co_3O_4(50 nm)和CeO_2(20 nm)的超薄层,从而产生了优质,均匀和共形的层。在标准阴极气氛(CO_2 /空气30:70 vol%)下,在Li_2CO_3-K_2CO_3(62-38 mol%)共晶熔体中比较了这三个涂覆样品的电化学行为和形态特征,时间为230 h。最后指出了CO_3O_4,TiO_2和CeO_2涂层的优缺点。

著录项

  • 来源
    《International journal of hydrogen energy》 |2014年第23期|12233-12241|共9页
  • 作者单位

    Institut de Recherche de Chimie Paris, CNRS - Chimie ParisTech, 11 rue Pierre et Marie Curie, F-75005 Paris, France,Depto. de Quimica, Instituto Nacional de Investigaciones Nucleares, A.P. 18-1027, Mexico D.F. C.P.11801, Mexico;

    Institut de Recherche de Chimie Paris, CNRS - Chimie ParisTech, 11 rue Pierre et Marie Curie, F-75005 Paris, France;

    Institut de Recherche de Chimie Paris, CNRS - Chimie ParisTech, 11 rue Pierre et Marie Curie, F-75005 Paris, France;

    Depto. de Quimica, Instituto Nacional de Investigaciones Nucleares, A.P. 18-1027, Mexico D.F. C.P.11801, Mexico;

    Institut de Recherche de Chimie Paris, CNRS - Chimie ParisTech, 11 rue Pierre et Marie Curie, F-75005 Paris, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    MCFC; Titanium oxide; Cerium oxide; Cobalt oxide; ALD; Electrochemistry;

    机译:MCFC;钛氧化物氧化铈氧化钴ALD;电化学;

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