首页> 外文期刊>International journal of hydrogen energy >Effect of 100 KeV Ar~+ ion beam irradiation on ZnO thin films - Influence of morphology vis-a-vis electrode/electrolyte interface and its impact on photoelectrochemical water splitting
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Effect of 100 KeV Ar~+ ion beam irradiation on ZnO thin films - Influence of morphology vis-a-vis electrode/electrolyte interface and its impact on photoelectrochemical water splitting

机译:100 kev Ar〜+离子束辐射对ZnO薄膜的影响 - 形态vis-Vis电极/电解质界面的影响及其对光电化学水分裂的影响

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The present study attempts quantitative determination of changes in the morphological surface features viz. fractal dimension, lower and upper cut off length scale through Power Spectral Density analysis prior to and after irradiation of 100 KeV Ar+ ion beam at incidence angles of 0 degrees, 40 degrees and 60 degrees on ZnO thin films. All the unirradiated and irradiated samples are subjected to photoelectrochemical characterization and a correlation between photo electrochemical performance and morphological parameters is established. Sample irradiated at 40 degrees angle at the fluence of 5 x 10(16) ions/cm(2) is found to possess maximum fractal dimension of 2.72, lower and upper cut off length scale of 3.16 nm and 63.00 nm respectively. This sample exhibits maximum photocurrent density of 3.19 mA/cm(2) and applied bias photon-to-current efficiency of 1.12% at 1.23 V/RHE. Hydrogen gas collected for duration of 1 h for the same sample was -4.83 mLcm(-2). (C) 2021 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
机译:目前的研究试图定量测定形态表面的变化特征viz。通过在ZnO薄膜的入射角为100keV Ar +离子束之前和之后的功率谱密度分析,在0度,40度和60度的入射角下的电功率谱密度分析,降低和上切断长度。所有未辐射和辐照的样品受到光电化学表征,并且建立了光电化学性能与形态参数之间的相关性。发现在5×10(16)个/ cm(2)的流量下以40度角照射的样品具有2.72的最大分形尺寸,分别为3.16nm和63.00 nm。该样品表现出3.19mA / cm(2)的最大光电流密度,并施加1.23V / RHE的偏置光子至电流效率为1.12%。在相同样品中持续1小时收集的氢气为-4.83mlcm(-2)。 (c)2021氢能出版物LLC。 elsevier有限公司出版。保留所有权利。

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