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Numerical and experimental study on silica generating counterflow diffusion flames

机译:二氧化硅产生逆流扩散火焰的数值和实验研究

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Temperatures and concentrations of OH radicals in silica generating counterflow oxy-hydrogen diffusion flames are measured using a broadband coherent anti-Stokes Raman spectroscopy (CARS) and a planar laser induced fluorescence (PLIF) techniques to study thermo-chemical effects of SiCl_4 addition to flames. Numerical analysis considering detailed chemical reactions including silica generating reactions is also conducted. The experimental results demonstrate that temperatures decrease in preheated zone due to the increase in specific heat of the gas mixture while the decrease is mitigated in particle formation zone due to the heat release through hydrolysis and oxidation reactions of SiCl_4. Also, OH concentrations significantly decrease in silica formation flame, which can be attributed to the consumption of oxi-dative radicals during the silica generating reactions of SiCl_4 and depletion of OH by HCl. The numerical simulation agrees well for flames having relatively low flame temperatures of 1750K but underestimates the decrease in OH concentration for high temperature flame over 2700 K. The disagreement for the high temperature flames would imply possible OH consumption via direct reactions between OH radicals and silicon chlorides, which is expected to be highly sensitive to temperature.
机译:使用宽带相干反斯托克斯拉曼光谱仪(CARS)和平面激光诱导荧光(PLIF)技术测量产生火焰的SiCl_4的热化学效应,从而测量产生逆流氧氢扩散火焰的二氧化硅中OH自由基的温度和浓度。 。还进行了考虑详细的化学反应(包括二氧化硅生成反应)的数值分析。实验结果表明,由于气体混合物比热的增加,预热区的温度下降,而由于SiCl_4的水解和氧化反应释放的热量,颗粒形成区的温度下降得到缓解。而且,二氧化硅形成火焰中的OH浓度显着降低,这可以归因于在二氧化硅生成的SiCl_4反应和HCl消耗OH的过程中氧化自由基的消耗。数值模拟对于火焰温度相对较低的1750K火焰非常吻合,但低估了2700 K以上高温火焰中OH浓度的降低。高温火焰的分歧将暗示OH自由基与氯化硅之间的直接反应可能消耗OH。 ,它对温度高度敏感。

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