机译:钨薄膜在红外光谱中的光谱辐射特性
The George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA;
The George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA;
The George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA;
Thermal Sciences and Materials Branch, Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright Patterson AFB, OH 45433, USA;
Thermal Sciences and Materials Branch, Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright Patterson AFB, OH 45433, USA;
Dielectric function; Infrared; Radiative properties; Thin film; Tungsten;
机译:IR光谱范围为1.5-14.2的公共介电材料薄膜的辐射性能。 <重点类型=“斜体”>μ Emphasis> M:应用于红外成像
机译:同时测量碳掺杂Al0.33Ga0.67AS掺杂Al0.33Ga0.67as薄膜和薄膜掺杂GaAs衬底之间的薄膜和热辐射电阻的薄膜和热界电阻
机译:高Tc超导Y-Ba-Cu-O薄膜在低温下的中红外辐射特性-I:实验
机译:钨尖端上形成的碳化钨薄膜的场发射特性
机译:纯氮掺杂的纳米氧化钨薄膜的结构和电子性能。
机译:甘油修饰的钨铵前驱体溶液对宽带隙WO3薄膜的影响及其电致变色性能。
机译:一种测量金属和超导薄膜的远红外辐射特性的技术