首页> 外文期刊>International Journal of Electronics Engineering Research >Novel Work on Low Power Multiplexer for High Speed Switching Devices Using Sleep Transistor Techniques
【24h】

Novel Work on Low Power Multiplexer for High Speed Switching Devices Using Sleep Transistor Techniques

机译:利用睡眠晶体管技术的高速开关设备低功耗多路复用器的新工作

获取原文
获取原文并翻译 | 示例
       

摘要

In nanometer advances, static power utilization is a noteworthy concern. In addition to innovation in downsizing and higher working rates of CMOS VLSI circuits, the leakage power is being upgraded. As the geometries of the procedure decrease, increases in thickness of the device as well as the voltage of the threshold just as the thickness of the oxide decreases to keep pace with execution. Different strategies for controlling sub threshold leakage reduction. Furthermore, another method for small and quick leakage is also suggested here. Because of the elevated transistor density, low threshold and ultrathin dielectric, the leakage control dissemination increases rapidly as the innovation scales down to deep submicron level. The new suggested circuit approach includes sleepy Multiplexer and associate Transistors to reduce leakage current with an appropriate W/L ratio. The suggested scheme provides fast execution as it incorporates NMOS Transistor into the framework with greater electron mobility. Intemperate by and substantial execution highlight is inserted into small-scale devices in nanotechnology development. In this paper where conventional Multiplexer consume 170μw in 180nm technology as such at 45nm technology it's consume 27μw in active mode. In sleepy multiplexer both active as well as static mode the power dissipation reduces 12 times, at 180nm technology sleepy Multiplexer consume power 80μw in active mode and in static mode its consumes 24μw power, as well as at 45nm technology Sleepy Multiplexer consume 6.6μw power in active mode and in static mode its consume 2.5μw.
机译:在纳米技术的发展中,静态功率利用率是一个值得注意的问题。除了在缩小尺寸和提高CMOS VLSI电路工作效率方面的创新外,泄漏功率也在提高。随着过程的几何形状的减小,器件的厚度以及阈值电压都会增加,就像氧化物的厚度减小一样,以跟上执行的步伐。用于控制子阈值泄漏减少的不同策略。此外,这里还提出了另一种小而快速的泄漏方法。由于晶体管密度的提高,阈值低和介电层超薄,随着创新规模逐渐缩小至深亚微米水平,泄漏控制的传播迅速增加。建议使用的新电路方法包括休眠的多路复用器和相关晶体管,以适当的W / L比率降低泄漏电流。所建议的方案将NMOS晶体管结合到具有更大电子迁移率的框架中,从而提供了快速执行。在纳米技术开发中,不拘小节和大量执行的亮点已插入到小型设备中。在本文中,传统的多路复用器在180nm技术下消耗170μw,而在45nm技术下则在有源模式下消耗27μw。在睡眠和静态模式下的多路复用器中,功耗均降低了12倍,在180nm技术下,睡眠多路复用器在活动模式下功耗为80μw,在静态模式下,其功耗为24μw,而在45nm技术下,睡眠多路复用器功耗为6.6μw。主动模式和静态模式下的功耗为2.5μw。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号