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Heat transfer from a non-isothermal rotating rough disk subjected to forced flow

机译:来自非等温旋转粗盘的热传递经过强制流动

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This communication aims to report heat transfer characteristics from a non-isothermal wavy disk rotating in a forced flow. The primary objective of this kind of studies is to seek a suitable mechanism for the quick removal of heat energy from a rotating disk surface. The achievement of an efficient mechanism which ensures a further higher rate of heat transfer is a fundamental goal in such studies. In this regard active and passive techniques are of fundamental importance whereby the current study utilizes a combination of both. There are three key elements, namely, the nonuniform disk temperature; surface roughness, and a radial free flow, which are responsible for the augmentation of the heat transfer. The analysis has been carried out for a variety of fluids depicting the increased rate of heat transfer due to a variation of these different elements. In doing so, the local and global heat transfer rates are manipulated in order to obtain a clear picture of the heat transfer process at a corrugated disk. The considered rough non-isothermal disk (with two sinusoids) rotating in the uniform stream of air (Pr = 0.71) leads to a significant (about 263%) enhancement in the overall heat transfer rate compared to that of a flat free rotating disk having surface temperature as quatratic function of the radial coordinate. Moreover, some threshold values (which correspond to seizing the heat transfer process) of the used power-index of the disk temperature (T_w — T_∞ = c_0r~(n*)) are also identified which are observed to vary slightly due to the surface irregularities and the relative motion of fluid and disk.
机译:该交流旨在报告非等温波浪盘在强制流动下的传热特性。这类研究的主要目的是寻求一种合适的机制,以从旋转的磁盘表面快速去除热能。在这种研究中,实现有效机制以确保更高的传热速率是一个基本目标。在这方面,主动和被动技术至关重要,因此,当前的研究利用了两者的结合。有三个关键因素,即磁盘温度不均匀;表面粗糙度和径向自由流动是增加传热的原因。已对各种流体进行了分析,这些流体描述了由于这些不同元素的变化而导致的传热速率增加。这样做时,要控制局部和整体的传热速率,以便清楚地了解波纹盘处的传热过程。在具有均匀空气流(Pr = 0.71)的情况下旋转的粗糙非等温圆盘(具有两个正弦曲线)与具有一个平面自由旋转圆盘的整体传热速率相比,可显着提高(大约263%)表面温度是径向坐标的四次函数。此外,还确定了磁盘温度的已用功率指标的一些阈值(对应于抓住传热过程)(T_w_T_∞= c_0r〜(n *)),这些阈值由于温度的变化而略有变化。表面不规则以及流体和磁盘的相对运动。

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