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Assessment of STT-MRAMs based on double-barrier MTJs for cache applications by means of a device-to-system level simulation framework

机译:通过设备到系统级仿真框架评估基于双屏障MTJ的STT-MRAM用于缓存应用

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摘要

This paper explores non-volatile cache memories implemented by spin-transfer torque magnetic random access memories (STT-MRAMs) based on state-of-the-art perpendicular magnetic tunnel junctions (MTJs) and FinFETs. The use of double-barrier MTJs with two reference layers (DMTJs) is benchmarked against solutions relying on single-barrier MTJs (SMTJs) at different technology nodes (from 28-nm down to 20-nm). Our study is carried out through a cross-layer simulation platform, starting from the device- up to the system-level. Our results point out that, thanks to the reduced switching currents, DMTJ-based SIT-MRAMs allow decreasing write access time of about 63% as compared to their SMTJ-based counterparts. This is achieved while assuring reduced energy consumption under both write (-42%) and read (-28%) accesses, lower area occupancy (-40%) and smaller leakage power (-25%), at the only cost of worsened read access time. This makes DMTJ-based STT-MRAM a promising candidate to replace conventional semiconductor-based cache memory for the next-generation of low-power microprocessors with on-chip non-volatility.
机译:本文探讨了基于最先进的垂直磁隧道结(MTJ)和FinFET的自旋传递转矩磁性随机存取存储器(STT-MRAM)实现的非易失性高速缓存。将具有两个参考层(DMTJ)的双屏障MTJ的使用与在不同技术节点(从28 nm到20 nm)上依赖单屏障MTJ(SMTJ)的解决方案进行了基准测试。我们的研究是通过跨层仿真平台进行的,从设备到系统级。我们的结果指出,由于开关电流的减少,与基于SMTJ的同类产品相比,基于DMTJ的SIT-MRAM可以将写入访问时间减少约63%。这是在确保降低写入(-42%)和读取(-28%)访问能耗,较低的区域占用率(-40%)和较小的泄漏功率(-25%)的情况下实现的,而这仅以降低读取质量为代价访问时间。这使得基于DMTJ的STT-MRAM有望取代具有片上非易失性的下一代低功耗微处理器的传统基于半导体的高速缓存。

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