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High performance energy efficient radiation hardened latch for low voltage applications

机译:高性能节能辐射硬化闩锁,适用于低压应用

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摘要

Energy efficiency is considered to be the most critical design parameter for IoT and other ultra low power applications. However, energy efficient circuits show a lesser immunity against soft error, because of the smaller device node capacitances in nanoscale technologies and near-threshold voltage operation. Due to these reasons, the tolerance of the sequential circuits to SEUs is an important consideration in nanoscale near threshold CMOS design. This paper presents an energy efficient SEU tolerant latch. The proposed latch improves the SEU tolerance by using a clocked Muller- C and memory elements based restorer circuit. The parasitic extracted simulations using STMicroelectronics 65 nm CMOS technology show that by employing the proposed latch, an average improvement of similar to 40% in energy delay product (EDP), is obtained over the recently reported latch. Moreover, the proposed latch is also validated in a TCAD calibrated PTM 32 nm framework and PTM 22 nm CMOS technology nodes. In 32 nm and 22 nm technologies, the proposed latch improves the EDP similar to 12% and 59% over existing latches respectively.
机译:能源效率被认为是物联网和其他超低功耗应用的最关键设计参数。但是,由于纳米技术中较小的设备节点电容和接近阈值的电压工作,节能电路对软错误的抵抗力较小。由于这些原因,时序电路对SEU的容限是纳米级近阈值CMOS设计中的重要考虑因素。本文提出了一种高能效的SEU耐受闩锁。所提出的锁存器通过使用基于时钟的Muller-C和基于存储元件的恢复器电路来提高SEU容限。使用意法半导体(STMicroelectronics)的65 nm CMOS技术提取的寄生仿真结果表明,与最近报告的锁存器相比,通过采用建议的锁存器,可以将能量延迟积(EDP)的平均提高幅度达到40%。此外,建议的锁存器也在TCAD校准的PTM 32 nm框架和PTM 22 nm CMOS技术节点中得到了验证。在32 nm和22 nm技术中,所提出的锁存器将EDP分别提高了约12%和59%。

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