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Preparation and Characterization of Sn-BSTS Topological Insulator for Universality Test of the Quantum Hall Effect

机译:用于量子霍尔效应通用性测试的Sn-BSTS拓扑绝缘子的制备与表征

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摘要

Single crystals of Sn0.02Bi1.08Sb0.9Te2S are grown and their transport properties are evaluated to precisely measure the quantum Hall effect on the metallic surface state of the topological insulator. The temperature dependence of the electrical resistance of the bulk samples is determined. The conduction in the material is explained by the parallelism of the inner bulk conduction and the metallic surface conduction. At low temperatures, surface conduction is the dominant one of the two. In order to measure thinner flakes of the material with an appropriate charge carrier control, the material is processed into measurement devices with the conventional lithography method. Device evaluation is also introduced.
机译:生长Sn0.02Bi1.08Sb0.9Te2S单晶并评估其传输性能,以精确测量拓扑绝缘体的金属表面状态的量子霍尔效应。确定了大块样品的电阻的温度依赖性。材料中的传导通过内部整体传导与金属表面传导的平行性来解释。在低温下,表面传导是两者中的主要一者。为了通过适当的载流子控制来测量材料的薄片,可以使用常规光刻方法将材料加工成测量设备。还介绍了设备评估。

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