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首页> 外文期刊>IEEE Transactions on Instrumentation and Measurement >A Fluxgate-Based Approach for Ion Beam Current Measurement in ECRIS Beamline: Design and Preliminary Investigations
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A Fluxgate-Based Approach for Ion Beam Current Measurement in ECRIS Beamline: Design and Preliminary Investigations

机译:ECRIS束流线中基于磁通门的离子束电流测量方法:设计和初步研究

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摘要

Beam diagnostic and especially beam current measurements represent a key aspect in the production of a high-quality beam. Due to the known interplay between beam current and beam and plasma properties, many solutions have been addressed to solve this need. Although precise beam current measuring systems exist, they cannot provide noninvasive solutions for the measurement of very low-frequency currents in electron cyclotron resonance ion source (ECRIS) beamline, with a range from tens to hundreds of microamperes. To address the above-mentioned needs, this paper proposes an indirect measurement methodology based on the estimation of the magnetic field produced by target current exploiting a residence time difference fluxgate and a flux concentrator (a mechanical structure able to constrain produced magnetic field in a given area). The main advantage of this approach is related to the possibility to perform a noninvasive current measurement. An optimal geometry for the flux concentrator has been investigated by using a finite-element method analysis that has led to the definition of a minimum value of the magnetic field generated by the minimum value of the target current, around 5.0 mu A, equal to 3.07 nT. To assess the solution, an experimental setup, miming real magnetic flux intensity inside ECRIS beamlines, has been realized. The measuring strategy has a magnetic resolution of 1 nT and a current resolution of 1.6 mu A, that is, in line with requirements. Results obtained demonstrate the suitability of the measurement system for the specific application addressed in this paper, both in terms of operating range and resolution.
机译:束诊断,尤其是束电流测量,代表了高质量束生产中的关键方面。由于束电流与束和等离子体特性之间的已知相互作用,已经提出了许多解决方案来解决这一需求。尽管存在精确的电子束电流测量系统,但它们无法为测量电子回旋共振离子源(ECRIS)束线中的低频电流提供非侵入性解决方案,其范围从几十到数百微安。为了满足上述需求,本文提出了一种间接测量方法,该方法基于利用停留时间差磁通门和磁通集中器(能够在给定的条件下约束产生的磁场的机械结构)估算目标电流产生的磁场的方法。区域)。这种方法的主要优点与执行无创电流测量的可能性有关。通过使用有限元方法分析研究了通量集中器的最佳几何形状,该分析导致定义了由目标电流最小值产生的磁场最小值,约为5.0μA,等于3.07 nT。为了评估解决方案,已经实现了一种模拟ECRIS光束线内部实际磁通强度的实验装置。测量策略的磁分辨率为1 nT,电流分辨率为1.6μA,符合要求。所获得的结果证明了该测量系统对于本文所涉及的特定应用的适用性,无论是工作范围还是分辨率。

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