Next-generation lithography

摘要

Suess MicroTec has launched a lithography tool, which according to the company will replace traditional optical lithography for the production of nano-scale devices. The Siiss NPS300 Nano-Patterning Stepper was developed within the Sixth Framework Program in cooperation with the VTT Micro-electronics Center during a one-year project. In March 2004, a four-year European Commission NaPa project was initiated to develop nano-patterning methods aimed at integrating top-down miniaturisation and bottom-up self-assembly fabrication approaches.