Material and Manufacturing Process Technologies of Discharge Deactivation Film for Stripe Rib PDPs

摘要

We developed material and process technologies concerned to DDF, which is formed on MgO surface around the inter-pixel gap to prevent vertical crosstalk discharge in stripe rib structure. First we tried with thin film deposition and lift-off patterning to find Al_2O_3 and TiO_2 are both available for DDF material. Next we tried with thick film printing in favor of mass productivity for large size PDPs. In case DDF included PbO glass, we met serious hardship in generating discharge. The problem was perfectly solved by having thick film DDF composed of 100 nm sized Al_2O_3 grains without glass component. Its γ_i was about 1/5 that of MgO, suggesting that the thick film DDF is almost compatible with thin film Al_2O_3 in electron emission characteristics. Such very small grain size contributes to DDF transparency, which is excellently high. In addition to it, such DDF is equipped with cushioning effect to prevent dot defects caused by rib breakage. Furthermore the DDF functions as getter during panel exhaustion to bring deep blue color by promoting deoxidization of blue phosphor provided that its volume is small enough. Transparent DDF may be rather better than black one with respect to bright room contrast ratio, not to mention to avoiding terrible sparking discharge. Thus material and process technologies for DDF have been almost fixed in success.