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Magnetics on Silicon: An Enabling Technology for Power Supply on Chip

机译:硅上的磁性材料:片上电源的一种使能技术

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Data from the ITRS2003 roadmap for 2010 predicts voltages for microprocessors in hand-held electronics will decrease to 0.8 V with current and power increasing to 4 A and 3 W, respectively. Consequently, low power converters will move to multimegahertz frequencies with a resulting reduction in capacitor and inductor values by factors of 5 and 20, respectively. Values required at 10 MHz, for a low power buck converter, are estimated at 130 nH and 0.6 uF, compatible with the integration of magnetics onto silicon and the concept of power supply-on-chip (PSOC). A review of magnetics-on-silicon shows that inductance values of 20 to 40 nH/mm{sup}2 can be achieved for winding resistances less than 1 Ω. A 1-μH inductance can be achieved at 5 MHz with dc resistance of 1 Ω and a Q of four. Thin film magnetic materials, compatible with semiconductor processing, offer power loss density that is lower than ferrite by a factor of 5 at 10 MHz. Other data reported includes, lowest dc resistance values of 120 mΩ for an inductance of 120 nH; highest Q of 15 for an inductance of 350 nH and a current of 1 A for a 1-μH inductor. Future technology challenges include reducing losses using high resistivity, laminated magnetic materials, and increasing current carrying capability using high aspect-ratio, electroplated copper conductors. Compatible technologies are available in the power switch, control, and packaging space. Integrated capacitor technology is still a long-term challenge with maximum reported values of 400nF/cm{sup}2.
机译:来自ITRS2003路线图的2010年数据预测,随着电流和功率分别增加到4 A和3 W,手持电子设备中微处理器的电压将降低到0.8V。因此,低功率转换器将移至兆赫兹频率,从而使电容器和电感器值分别减少5倍和20倍。对于低功率降压转换器,在10 MHz时所需的值估计为130 nH和0.6 uF,与磁性材料在硅片上的集成以及片上电源(PSOC)的概念兼容。对硅上磁性材料的回顾表明,对于小于1Ω的绕组电阻,可以实现20至40 nH / mm {sup} 2的电感值。在5 MHz时可实现1-μH的电感,直流电阻为1Ω,Q值为4。与半导体工艺兼容的薄膜磁性材料在10 MHz时的功率损耗密度比铁氧体低5倍。报告的其他数据包括:对于120 nH的电感,最低直流电阻值为120mΩ。对于350 nH的电感,最大Q为15;对于1μH的电感,电流为1A。未来的技术挑战包括使用高电阻率的叠层磁性材料降低损耗,以及使用高纵横比的电镀铜导体提高载流能力。在电源开关,控制和封装空间中可以使用兼容的技术。集成电容器技术仍然是一项长期挑战,其最大报告值为400nF / cm {sup} 2。

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