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首页> 外文期刊>IEEE Transactions on Nuclear Science >Effects of Total-Ionizing-Dose Irradiation on SEU- and SET-Induced Soft Errors in Bulk 40-nm Sequential Circuits
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Effects of Total-Ionizing-Dose Irradiation on SEU- and SET-Induced Soft Errors in Bulk 40-nm Sequential Circuits

机译:总电离剂量辐照对40nm时序电路中SEU和SET引起的软错误的影响

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摘要

Synergetic effects of total-ionizing-dose irradiation on the single event upset (SEU) and single event transient (SET) performance of 40-nm sequential circuits are studied at doses up to 2 Mrad(SiO2). The impacts of input pattern and supply voltage are evaluated. An initial increase of SEU- and SET-induced soft error cross-section versus total dose is observed, followed by a decreasing trend at higher doses. The maximum increase of SEU- and SET-induced soft error cross-section occurs when the total-ionizing-dose is approximately 1.5 Mrad(SiO2) in the studied sequential circuit. The SET-induced soft error cross-section versus total dose increases at a faster speed than the SEU-induced soft error cross-section.
机译:以最高2 Mrad(SiO2)的剂量研究了总电离剂量辐照对40 nm顺序电路的单事件翻转(SEU)和单事件瞬态(SET)性能的协同效应。评估输入模式和电源电压的影响。观察到SEU和SET诱导的软误差横截面相对于总剂量的最初增加,然后随着剂量的增加而下降。当所研究的顺序电路中的总电离剂量约为1.5 Mrad(SiO2)时,会出现SEU和SET引起的软错误横截面的最大增加。 SET引起的软误差横截面相对于总剂量的增加速度快于SEU引起的软误差横截面。

著录项

  • 来源
    《IEEE Transactions on Nuclear Science 》 |2017年第1期| 471-476| 共6页
  • 作者单位

    Department of Engineering Physics, Key Laboratory of Particle & Radiation Imaging, Ministry of Education, Tsinghua University, Beijing, China;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    NXP Semiconductor Inc., Austin, TX, USA;

    Beijing Microelectronics Technology Institute, Beijing, China;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Engineering Physics, Key Laboratory of Particle & Radiation Imaging, Ministry of Education, Tsinghua University, Beijing, China;

    Broadcom ® Corporation, Irvine, CA, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

    Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Leakage currents; Radiation effects; Voltage measurement; Current measurement; Integrated circuits; Single event upsets; Logic gates;

    机译:泄漏电流;辐射效应;电压测量;电流测量;集成电路;单事件失常;逻辑门;

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