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首页> 外文期刊>IEEE transactions on nanotechnology >Localized growth of suspended SWCNTs by means of an 'all-laser' process and their direct integration into nanoelectronic devices
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Localized growth of suspended SWCNTs by means of an 'all-laser' process and their direct integration into nanoelectronic devices

机译:通过“全激光”工艺实现悬浮SWCNT的局部生长,并将其直接集成到纳米电子器件中

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We have successfully developed an "all-laser" processing for the localized growth of suspended single-wall carbon nanotubes (SWCNTs) on prepatterned SiO/sub 2//Si substrates. Our "all-laser" process stands out by its exclusive use of the same KrF excimer laser, first, to deposit the embedded-catalyst electrodes with a controllable architecture and, second, to grow SWCNTs through the pulsed laser ablation of a pure graphite target. Under the optimal growth conditions, the suspended SWCNTs are shown to bridge laterally adjacent electrodes separated by a gap of /spl sim/2 /spl mu/m. These SWCNTs (having diameters in the 1.25-1.64-nm range) generally tend to auto-assemble into bundles of /spl sim/5--15 nm in diameter. The "all-laser" process here developed offers the advantage of a direct integration of the SWCNTs into field-effect-transistor-like devices with no postprocessing, thereby permitting the investigation of their electrical transport properties. Thus, the suspended SWCNT bundles are shown to behave collectively as an ambipolar transistor with ON/OFF switching ratios as high as /spl sim/10/sup 4/.
机译:我们已经成功地开发出了一种“全激光”工艺,用于在预先图案化的SiO / sub 2 // Si衬底上悬浮单壁碳纳米管(SWCNT)的局部生长。我们的“全激光”工艺的独特之处在于,它仅使用相同的KrF准分子激光,首先,以可控制的结构沉积嵌入式催化剂电极,其次,通过脉冲激光烧蚀纯石墨靶材来生长SWCNT。 。在最佳的生长条件下,悬浮的SWCNT被显示为桥接横向相邻的电极,电极间隔为/ spl sim / 2 / spl mu / m。这些SWCNT(直径在1.25-1.64-nm范围内)通常倾向于自动组装成直径为/ spl sim / 5--15 nm的束。这里开发的“全激光”工艺提供了将SWCNT直接集成到类似场效应晶体管的器件中的优势,而无需进行后处理,从而可以研究其电传输特性。因此,显示出悬浮的SWCNT束共同充当双极性晶体管,其ON / OFF开关比高达/ spl sim / 10 / sup 4 /。

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