Quasi-static analysis of coupled microstrip lines with asymmetrical finite metallization thickness

摘要

This paper describes the quasi-static analysis of coupled microstrip lines with asymmetrical finite metallization thickness. A generalized mode-matching method extended from the conventional mode-matching method has been used to analyze the inhomogeneous structure with arbitrary metallization thickness and is validated through comparison with those from other available results. This method cannot only provide a simple approach to the quasi-static analysis of the inhomogeneous structures with arbitrary metallization thickness, but can also be applied to analyze the effect of metal penetration depth into the substrate. The results show that the asymmetrical finite metallization thickness and metal penetration depth into the substrate can be newly added to the quasi-static design parameters of coupled microstrip lines.