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Mo-Re superconducting thin films by single target magnetron sputtering

机译:单靶磁控溅射制备Mo-Re超导薄膜

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摘要

The authors prepared Mo/sub 60/Re/sub 40/ thin films by single target magnetron sputtering. All the films analyzed exhibited a sharp superconductive transition and values of the critical temperature T/sub c/ up to 13 K were achieved. Structural analyses (EDS and X-rays) were performed on the samples. A15 phase was obtained even at low deposition temperatures. From the measured low temperature resistivity O/sub c/ and critical temperature T/sub c/ an estimate of the theoretical BCS surface resistance is inferred and compared with that of niobium.
机译:作者通过单靶磁控溅射制备了Mo / sub 60 / Re / sub 40 /薄膜。分析的所有膜均显示出尖锐的超导转变,并且达到了高达13 K的临界温度T / sub c /的值。对样品进行结构分析(EDS和X射线)。即使在低沉积温度下也获得A15相。根据测得的低温电阻率O / sub c /和临界温度T / sub c /,可以得出理论BCS表面电阻的估算值,并与铌进行比较。

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