Ar-sputtered Pt/Co multilayers with large anisotropy energy and coercivity

摘要

We have discovered a process for Ar-sputtering Pt/Co multilayers, a candidate for high density magneto-optical recording medium, so that they have large anisotropy energy (K/sub eff/ /spl sim/1.2/spl times/10/sup 7/ erg/cm/sup 3/-Co) and large coercivity (H/sub c/ /spl sim/3.5 kOe) simultaneously. To achieve these improved properties the multilayers were sputtered on granular Pt underlayers, made by etching thin Pt layers, initially 20-40 /spl Aring/ thick. Plan-view transmission electron microscopy revealed that the microstructures of Pt/Co multilayers, grown on etched-Pt underlayers, was also granular with excellent (111)-fcc texture. Both K/sub eff/ and H/sub c/ were optimized, when the (111)-fcc texture was a maximum.