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首页> 外文期刊>IEEE Transactions on Magnetics >High frequency characterization and recording performance of NiFe and laminated FeN heads
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High frequency characterization and recording performance of NiFe and laminated FeN heads

机译:NiFe和叠层FeN磁头的高频特性和记录性能

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摘要

A simple high frequency characterization technique extended from DC disk erasure is presented to measure the write field degradation for frequencies up to 500 Mfc/s (250 MHz) on plated NiFe and sputtered laminated FeN heads. The results show that eddy currents appear to be the main cause for high frequency write field degradation. Overwrite recording measurements, which may be used to approximate the non-linear write effects, also indicate that FeN heads, despite low efficiency, may be adequate for writing up to 100 MHz on a disk with a coercivity of 2500 Oe. This disk is capable of supporting 5-10 Gb/in/sup 2/ densities.
机译:提出了一种从直流磁盘擦除扩展而来的简单高频表征技术,以测量镀镍铁和溅射叠层铁磁头上高达500 Mfc / s(250 MHz)的频率下的写入场衰减。结果表明,涡电流似乎是高频写入场退化的主要原因。覆盖记录测量(可用于近似非线性写入效果)也表明,尽管效率很低,但FeN磁头可能足以在矫顽力为2500 Oe的磁盘上以高达100 MHz的速度写入。该磁盘能够支持5-10 Gb / in / sup 2 /密度。

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