首页> 外文期刊>IEEE Transactions on Magnetics >Effect of Tilted Magnetic Anisotropy on the Deterministic Current-Induced Magnetization Reversal in Quasi-Perpendicularly Magnetized Ta/Pt/CoFeB/Pt Multilayers
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Effect of Tilted Magnetic Anisotropy on the Deterministic Current-Induced Magnetization Reversal in Quasi-Perpendicularly Magnetized Ta/Pt/CoFeB/Pt Multilayers

机译:倾斜的磁各向异性对准垂直磁化Ta / Pt / CoFeB / Pt多层膜中确定性电流感应磁化反转的影响

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摘要

Deterministic current-induced magnetization reversal is observed in quasi-perpendicularly magnetized Ta/Pt/CoFeB/Pt multilayer thin films without the assistance of an in-plane field. In a quasi-perpendicularly magnetized system, the anisotropy is tilted slightly away from the normal to the film plane. This tilt in the anisotropy is obtained by growing the films in an oblique-angle sputter deposition technique, which results in a gradient in the thickness of the layers. To estimate the tilt, out-of-plane hysteresis loop measurements are performed in the presence of an in-plane bias field. The effect of the tilt is reflected in the shift in the hysteresis loop. A measurement of this shift at different relative azimuthal orientations of the in-plane projection of the tilt direction with respect to the in-plane bias field direction gives a tilt of 0.74° (±0.06°) in Ta(3 nm)Pt(3 nm)CoFeB(0.5 nm)Pt(1 nm) with all the layers having a thickness gradient. In addition, field-induced domain wall velocity measurements in the creep regime on Ta(3 nm)Pt(3 nm)CoFeB(0.5 nm)Pt(1 nm) thin film with a thickness gradient only in CoFeB layer give an elliptical profile for the domain wall. In the current-induced magnetization reversal studies, threshold current density of 1.06 × 1011Am-2is required to deterministically switch the device fabricated from Ta(3 nm)Pt(3 nm)CoFeB(0.5 nm)Pt(1 nm) thin film with all the layers having a thickness gradient. On application of in-plane bias, there is a shift in the threshold current densities given by 2.6 × 108Am-2of in-plane bias field.
机译:在准垂直磁化的Ta / Pt / CoFeB / Pt多层薄膜中,在没有面内电场的情况下观察到确定性的电流感应磁化反转。在准垂直磁化系统中,各向异性从薄膜平面的法线稍微倾斜一点。各向异性的这种倾斜是通过以斜角溅射沉积技术生长薄膜而获得的,这导致了层厚度的梯度。为了估计倾斜度,在存在平面内偏置场的情况下执行平面外磁滞回线测量。倾斜的影响反映在磁滞回线的偏移中。在倾斜方向的平面内投影相对于平面内偏置磁场方向的不同相对方位角方位上的此偏移的测量结果表明,Ta(3 nm)Pt(3)中的倾斜度为0.74°(±0.06°)纳米)CoFeB(0.5纳米)Pt(1纳米),所有层均具有厚度梯度。此外,仅在CoFeB层中具有厚度梯度的Ta(3 nm)Pt(3 nm)CoFeB(0.5 nm)Pt(1 nm)薄膜在蠕变状态下的场致畴壁速度测量值给出了椭圆形域墙。在电流感应的磁化反转研究中,阈值电流密度为1.06×10 n 11 nAm n -2 nis确定性地切换由Ta(3 nm)Pt(3 nm)CoFeB(0.5纳米)Pt(1纳米)薄膜,所有层的厚度均具有梯度。在施加平面偏置时,阈值电流密度由2.6×10 n 8 nAm n -2 nof平面内偏置字段。

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