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Influence of MgO Tunnel Barrier Thickness on the Output Power of Three-Terminal Spin Hall Nano-Oscillators

机译:MgO隧道势垒厚度对三端自旋霍尔纳米振荡器输出功率的影响

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摘要

Magnetic tunnel junction nanopillar devices were patterned into three-terminal spin Hall nano-oscillators starting from a 200 mm wafer with an MgO barrier wedge with a nominal thickness variation between 0.72 and 1.36 nm. The resulting devices, with R × A values in the range between 1 and 110 Ω · μm2, were characterized in the frequency domain in an attempt to optimize the MgO barrier thickness with respect to the nano-oscillators output power. While all the devices exhibit oscillations, the integrated matched output power reaches a maximum of 12.5 nW for an R × A of 34 Ω · μm2with a nominal MgO thickness of 1.2 nm.
机译:磁性隧道结纳米柱器件被图案化为三端自旋霍尔纳米振荡器,其始于200 mm的晶圆,该晶圆具有MgO阻挡楔,其标称厚度变化在0.72和1.36 nm之间。所得设备的R×A值在1到110Ω之间。μm n 2 n进行了表征,以针对纳米振荡器的输出功率来优化MgO势垒厚度。当所有设备都出现振荡时,对于R×A为34Ω·μm n 2 n,标称的MgO厚度为1.2 nm。

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  • 来源
    《IEEE Transactions on Magnetics》 |2018年第11期|1-4|共4页
  • 作者单位

    Department of Nanoelectronics, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

    Department of Nanoelectronics, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

    Department of Nanoelectronics, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

    Department of Quantum Materials, Science and Technology, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

    Department of Nanoelectronics, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

    Department of Nanoelectronics, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

    Department of Nanoelectronics, INL–International Iberian Nanotechnology Laboratory, Braga, Portugal;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Magnetic tunneling; Nanoscale devices; Tunneling magnetoresistance; Couplings; Magnetic anisotropy; Current measurement;

    机译:磁隧穿;纳米器件;隧道磁阻;耦合;磁各向异性;电流测量;

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