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Soft Anisotropic Fe{sub}65Co{sub}35/Co Thin Films Prepared by Facing Targets Sputtering

机译:面向靶溅射制备的各向异性Fe {sub} 65Co {sub} 35 / Co软各向异性薄膜

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摘要

High saturation magnetization FeCo(Fe{sub}65Co{sub}35) /Co films with 4πM{sub}s about 24 kG were prepared by facing targets sputtering (FTS). A well-defined in-plane uniaxial anisotropy and excellent soft magnetic properties were obtained with a hard axis coercivity of H{sub}(ch) = 3 Oe by inserting a thin Co underlayer. The X-ray diffractometry (XRD) results indicate that the Co underlayer changed the main diffraction line from (200) in the FeCo single layer to (110) in the FeCo/Co films. The Co underlayer significantly reduced the average grain size from ~74 nm for FeCo single layer to ^8.2 nm for FeCo/Co films. A smoother surface and a narrower grain size distribution were observed in FeCo/Co films.
机译:通过面对靶溅射(FTS)制备了具有约24kG的4πM{sub} s的高饱和磁化FeCo(Fe {sub} 65Co {sub} 35)/ Co膜。通过插入一个薄的Co底层,以H {sub}(ch)= 3 Oe的硬轴矫顽力获得了良好定义的面内单轴各向异性和出色的软磁性能。 X射线衍射(XRD)结果表明,Co底层将主衍射线从FeCo单层中的(200)更改为FeCo / Co膜中的(110)。 Co底层大大降低了平均晶粒尺寸,从单层FeCo的约74 nm减小到FeCo / Co薄膜的^ 8.2 nm。在FeCo / Co薄膜中观察到较光滑的表面和较窄的晶粒尺寸分布。

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