...
首页> 外文期刊>Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on >Modeling the Overshooting Effect for CMOS Inverter Delay Analysis in Nanometer Technologies
【24h】

Modeling the Overshooting Effect for CMOS Inverter Delay Analysis in Nanometer Technologies

机译:纳米技术中CMOS反相器延迟分析的过冲效应建模

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

With the scaling of complementary metal-oxide-semiconductor (CMOS) technology into the nanometer regime, the overshooting effect due to the input-to-output coupling capacitance has more significant influence on CMOS gate analysis, especially on CMOS gate static timing analysis. In this paper, the overshooting effect is modeled for CMOS inverter delay analysis in nanometer technologies. The results produced by the proposed model are close to simulation program with integrated circuit emphasis (SPICE). Moreover, the influence of the overshooting effect on CMOS inverter analysis is discussed. An analytical model is presented to calculate the CMOS inverter delay time based on the proposed overshooting effect model, which is verified to be in good agreement with SPICE results. Furthermore, the proposed model is used to improve the accuracy of the switch-resistor model for approximating the inverter output waveform.
机译:随着互补金属氧化物半导体(CMOS)技术的规模发展为纳米技术,由于输入输出耦合电容所引起的过冲效应对CMOS栅极分析,尤其是对CMOS栅极静态时序分析的影响更大。本文针对纳米技术中的CMOS反相器延迟分析对过冲效应进行了建模。所提出的模型产生的结果接近于具有集成电路重点(SPICE)的仿真程序。此外,讨论了过冲效应对CMOS反相器分析的影响。提出了一种基于提出的过冲效应模型来计算CMOS反相器延迟时间的解析模型,该模型经验证与SPICE结果吻合良好。此外,所提出的模型用于提高开关电阻器模型的精度,以逼近逆变器输出波形。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号