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首页> 外文期刊>Photonics Technology Letters, IEEE >Optimized Microcavity and Photonic Crystal Parameters of GaN-Based Ultrathin-Film Light-Emitting Diodes for Highly Directional Beam Profiles
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Optimized Microcavity and Photonic Crystal Parameters of GaN-Based Ultrathin-Film Light-Emitting Diodes for Highly Directional Beam Profiles

机译:基于GaN的超薄膜发光二极管的微腔和光子晶体参数的优化,可用于高度定向的光束轮廓

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摘要

This study experimentally investigates the highly directional far-field emission distributions of GaN ultrathin-film light-emitting diodes (uTFLEDs) with optimized microcavity thickness and photonic crystal (PhC) parameters. Results show that directionality depends on guided mode extraction behaviors and strong microcavity effects. The proposed GaN PhC uTFLED exhibited an output power extraction efficiency enhancement of 278% ( ${sim}3.78times$) compared to GaN non-PhC uTFLED, and produced a directional far-field emission pattern at half intensity near ${pm}$17$^{circ}$.
机译:这项研究实验研究了具有优化的微腔厚度和光子晶体(PhC)参数的GaN超薄膜发光二极管(uTFLED)的高方向远场发射分布。结果表明,方向性取决于引导模式的提取行为和强大的微腔效应。与GaN non-PhC uTFLED相比,拟议中的GaN PhC uTFLED的输出功率提取效率提高了278%($ {sim} 3.78×$),并在$ {pm} $ 17附近产生了一半强度的定向远场发射图形$ ^ {circ} $。

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