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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >A theoretical analysis of quantum-wire fabrication byvacancy-enhanced interdiffusion of quantum wells
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A theoretical analysis of quantum-wire fabrication byvacancy-enhanced interdiffusion of quantum wells

机译:空位增强的量子阱互扩散制备量子线的理论分析

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摘要

The fabrication of quantum-wire structures using vacancy enhancedninterdiffusion of quantum wells is analyzed theoretically. Anphenomenological equation is used to describe the effects of strain onnvacancy diffusion. The quantum-wire confinement potentials are studiednas a function of the trench opening widths and the separation distancesnfrom the SiO2-AlGaAs interface. The lateral confinementnenergy is not a monotonic function of the trench opening width. It firstnincreases and then decreases when the trench opening width is decreased.nWhen the separation distance of the quantum wire from the interface isnreduced, the confinement potential is changed from a nonsquare profilento a square-well profile
机译:从理论上分析了利用空位增强的量子阱的互扩散制造量子线结构。现象学方程用来描述应变对空位扩散的影响。研究了量子线束缚势,它是沟槽开口宽度和与SiO2-AlGaAs界面的分离距离n的函数。横向约束能量不是沟槽开口宽度的单调函数。当沟槽开口宽度减小时,它首先增大,然后减小。n当量子线与界面的分离距离减小时,约束电位从非正方形轮廓变为正方形阱轮廓

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