High-average-power femtosecond KrF excimer laser

Nabekawa Y.; Yoshitomi D.; Sekikawa T.; Watanabe S.

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High-average-power femtosecond KrF excimer laser

机译：高平均飞秒KrF准分子激光器

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摘要

Development of high-peak and high-average-power ultrashort pulsenKrF excimer lasers is described. Technical issues of KrF excimer as thenamplifying medium for the ultrashort pulses are dramatically improved,nresulting in a 50 W average power with a pulse width of 480 fs at 200 Hznrepetition rate

机译：描述了高峰值和高功率的超短脉冲nKrF准分子激光器的开发。 KrF准分子作为超短脉冲的放大介质的技术问题得到了显着改善，在200 Hzn重复频率下获得了50 W的平均功率和480 fs的脉冲宽度

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《IEEE journal of selected topics in quantum electronics》 |2001年第4期|p.551-558|共8页
作者
Nabekawa Y.; Yoshitomi D.; Sekikawa T.; Watanabe S.;
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原文格式 PDF
正文语种 eng
中图分类电工技术;
关键词
excimer lasers; krypton compounds; optical pulse generation; 200 Hz; 480 fs; 50 W; KrF; KrF excimer amplifying medium; KrF excimer laser; average power; high-average-power KrF excimer lasers; pulse width; repetition rate; ultrafast lasers; ultrashort pulse KrF excimer;

机译：准分子激光器;k化合物;光脉冲产生;200 Hz;480 fs;50 W;KrF;KrF准分子放大介质;KrF准分子激光器;平均功率;高平均功率KrF准分子激光器;脉冲宽度;重复率;超快激光器;超短脉冲KrF准分子;

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专利

1. Generation of tunable short pulse VUV radiation by four-wave mixing in xenon with femtosecond KrF-excimer laser pulses [J] . Tunnermann A., Momma C. IEEE Journal of Quantum Electronics . 1993,第4期

机译：在氙气中与飞秒KrF准分子激光脉冲四波混合产生可调的短脉冲VUV辐射
2. Photofragmentation laser-induced fluorescence of ozone using narrowband and broadband KrF excimer lasers [J] . Ono Ryo, Nakamura Takuya, Zhang Xiang Journal of Physics, D. Applied Physics: A Europhysics Journal . 2019,第4期

机译：使用窄带和宽带KRF准分子激光激光诱导臭氧的激光诱导的荧光
3. Laser-induced front side and back side etching of fused silica with KrF and XeF excimer lasers using metallic absorber layers: A comparison [J] . Pierre Lorenz, Martin Ehrhardt, Klaus Zimmer Applied Surface Science . 2012,第24期

机译：使用金属吸收层的KrF和XeF准分子激光对熔融石英进行激光诱导的正面和背面蚀刻：比较
4. High-average-power narrow-band KrF excimer laser [C] . Osamu Wakabayashi, Komatsu Ltd., Hiratsuka-shi, Optical/Laser Microlithography IV . 1991

机译：高平均功率窄带KrF准分子激光器
5. The third-order nonlinear process in femtosecond time-resolved four-wave mixing and femtosecond lasers. [D] . Wu, Song. 1993

机译：飞秒时间分辨四波混频和飞秒激光器中的三阶非线性过程。
6. Preparation of periodic surface structures on doped poly(methyl metacrylate) films by irradiation with KrF excimer laser [O] . Yevgeniya Kalachyova, Oleksiy Lyutakov, Petr Slepicka, 2014

机译：用KrF准分子激光辐照在掺杂的聚甲基丙烯酸甲酯薄膜上制备周期性表面结构
7. Generation of tunable short pulse VUV radiation by four-wave mixing in xenon with femtosecond KrF-excimer laser pulses [O] . Tünnermann, A., Momma, C., Mossavi, K., 1993

机译：利用飞秒KrF准分子激光脉冲在氙中通过四波混频产生可调谐短脉冲VUV辐射

High-average-power femtosecond KrF excimer laser

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