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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Properties of ion-implanted high-power angled-grating distributed-feedback lasers
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Properties of ion-implanted high-power angled-grating distributed-feedback lasers

机译:离子注入大功率角光栅分布反馈激光器的性能

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An improvement of the linearity of the light-current characteristics and the beam quality of high-power Α-distributed feedback lasers is achieved by an ion implantation of the regions outside the contact stripe. The linear part of the light-current characteristics of 4-mm-long devices emitting at 1060 nm is extended to P=1.8 W output power. The times-diffraction-limit factor M2 remains constant, equal to 1.7 over the whole power range. Simulations of the electro-optical behavior reveal that the improvement is achieved by a suppression of optical field components which propagate inside the cavity perpendicular to the facets.
机译:通过对接触条外部的区域进行离子注入,可以提高光功率特性的线性度和高功率Α分布反馈激光器的光束质量。在1060 nm处发射的4毫米长器件的光电流特性的线性部分扩展到P = 1.8 W输出功率。时间衍射极限因数M2在整个功率范围内保持恒定,等于1.7。电光行为的仿真表明,通过抑制垂直于刻面在腔体内传播的光场分量,可以实现这种改进。

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