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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Toward nanometer-scale resolution in fluorescence microscopy using spectral self-interference
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Toward nanometer-scale resolution in fluorescence microscopy using spectral self-interference

机译:使用光谱自干扰朝荧光显微镜检查纳米尺度分辨率

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摘要

We introduce a new fluorescence microscopy technique that maps the axial position of a fluorophore with subnanometer precision. The interference of the emission of fluorophores in proximity to a reflecting surface results in fringes in the fluorescence spectrum that provide a unique signature of the axial position of the fluorophore. The nanometer sensitivity is demonstrated by measuring the height of a fluorescein monolayer covering a 12-nm step etched in silicon dioxide. In addition, the separation between fluorophores attached to the top or the bottom layer in a lipid bilayer film is determined. We further discuss extension of this microscopy technique to provide resolution of multiple layers spaced as closely as 10 nm for sparse systems.
机译:我们介绍一种新的荧光显微镜技术,将荧光团的轴向位置与亚晶仪精度映射。荧光团邻近反射表面的发射的干扰导致荧光光谱中的条纹,其提供荧光团的轴向位置的独特签名。通过测量覆盖在二氧化硅中蚀刻的12-nm步骤的荧光素单层的高度来证明纳米敏感性。另外,确定附着在脂质双层膜中的顶部或底层的荧光团之间的分离。我们进一步讨论了这种显微镜技术的扩展,以便为稀疏系统尽可能靠近10 NM间隔开的多层的分辨率。

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