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Simulation Study of a Monolithic III-V/Si V-Groove Carrier Depletion Optical Phase Shifter

机译:单片III-V / SI V沟槽载体耗尽光学移相器的仿真研究

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摘要

In this paper, we propose a new carrier depletion-type hybrid III-V/Si optical phase shifter using a n-III-V/p-Si hetero-junction, which can be fabricated with direct epitaxial growth of III-V semiconductors on Si. We numerically analyzed the performance of the III-V/Si hybrid optical phase shifter by comparing the performance in reverse bias operation with that of pure Si or III-V p-n optical phase shifters. The hybrid III-V/Si optical phase shifter showed improved modulation efficiency and lower optical loss compared to pure Si and III-V p-n optical phase shifters, owing to the large electron-induced refractive index change of III-V compound semiconductors, while avoiding the large hole-induced optical loss of III-V compound semiconductor. The simulation study suggests the feasibility of a very low voltage-length product (V-pi L) of 0.07 V . cm, a low insertion loss (alpha) of 16 dB/cm, and a very low alpha V-pi L product close to 1 V . dB at 1.31 mu m, which is 10x lower than for Si p-n optical phase shifters.
机译:在本文中,我们提出了一种使用N-III-V / P-Si杂交联的新的载体耗尽式杂交III-V / Si光学相移器,其可以用III-V半导体的直接外延生长制造Si。通过将相反偏置操作的性能与纯SI或III-V P-N光学相移器的性能进行比较,在数值上分析了III-V / SI混合光学相移器的性能。与纯Si和III-V PN光学相移器相比,混合III-V / SI光学移相器显示出改善的调制效率和更低的光学损失,而III-V复合半导体的电诱导折射率变化,同时避免大孔诱导的III-V化合物半导体光学损失。仿真研究表明,0.07V的非常低电压长度产品(V-PI L)的可行性。 CM,低插入损耗(α)为16dB / cm,非常低的αV-PI L产品接近1 V。 DB为1.31 mu m,比Si P-N光相移器低10倍。

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