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Selective quantum-well intermixing in GaAs-AlGaAs structures using impurity-free vacancy diffusion

机译:使用无杂质空位扩散的GaAs-AlGaAs结构中的选择性量子阱混合

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Impurity-free vacancy disordering (IFVD) using SiO/sub 2/ and SrF/sub 2/ dielectric caps to induce selective quantum-well (QW) intermixing in the GaAs-AlGaAs system is studied. The intermixing rate of IFVD was found to be higher in n-i-p and intrinsic than in p-i-n structures, which suggests that the diffusion of the Group III vacancy is not supported in p-type material. Single-mode waveguides have been fabricated from both as-grown and bandgap-tuned double-quantum-well (DQW) laser samples. Propagation losses as low as 8.5 dB cm/sup -1/ were measured from the bandgap-tuned waveguides at the lasing wavelength of the undisordered material, i.e., 860 nm. Simulation was also carried out to study the contribution of free-carrier absorption from the cladding layers, and the leakage loss induced by the heavily p-doped GaAs contact layer. It was found that the leakage loss contributed by the GaAs cap layer is significant and increases with wavelength. Based on IFVD, we also demonstrate the fabrication of multiple-wavelength lasers and multichannel wavelength division multiplexers using the one-step "selective intermixing in selected area" technique. This technique enables one to control the degree of intermixing across a wafer. Lasers with bandgaps tuned to five different positions have been fabricated on a single chip. These lasers showed only small changes in transparency current, internal quantum efficiency, or internal propagation loss, which indicates that the quality of the material remains high after being intermixed. Four-channel wavelength demultiplexers based on a waveguide photodetector design have also been fabricated. Photocurrent and spontaneous emission spectra from individual diodes showed that the absorption edge was shifted by different degrees due to the selective degree of QW intermixing. The results obtained also imply that the technique can be used in the fabrication of broad-wavelength emission superluminescent diodes.
机译:研究了使用SiO / sub 2 /和SrF / sub 2 /介电帽在GaAs-AlGaAs系统中诱导选择性量子阱(QW)混合的无杂质空位无序(IFVD)。发现IFVD在n-i-p和本征中的混合率高于p-i-n结构,这表明在p型材料中不支持III类空位的扩散。单模波导已经由生长中的和带隙调谐的双量子阱(DQW)激光样品制成。从带隙调谐的波导在无序材料的激射波长,即860nm处测得的传播损耗低至8.5dB cm / sup -1。还进行了仿真研究,以研究包层吸收自由载流子的贡献,以及重掺杂p掺杂的GaAs接触层引起的泄漏损耗。发现由GaAs覆盖层引起的泄漏损耗是显着的并且随着波长增加。基于IFVD,我们还演示了使用一步式“选定区域中的选择性混合”技术制造多波长激光器和多通道波分复用器的过程。这项技术使人们能够控制整个晶圆的混合程度。将带隙调整到五个不同位置的激光器已经制造在单个芯片上。这些激光器在透明电流,内部量子效率或内部传播损耗方面仅表现出很小的变化,这表明在混合后材料的质量仍然很高。还已经制造了基于波导光电检测器设计的四通道波长解复用器。来自各个二极管的光电流和自发发射光谱表明,由于QW混合的选择性程度,吸收边缘发生了不同程度的偏移。获得的结果还暗示该技术可用于制造宽波长发射超发光二极管。

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