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Interfacial thermal contact resistance between aluminum nitride and copper at cryogenic temperature

机译:低温下氮化铝和铜之间的界面热接触电阻

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摘要

The purpose of this study was to investigate the interfacial thermal contact resistance (ITCR) between aluminum nitride and copper. The ITCR was measured based on one-dimension steady-state heat conduction over a temperature range of 90-210 K and over a contact pressure range of 0.3-1.0 MPa. Our results show that the ITCR between aluminum nitride and copper decreases with increasing contact pressure, and increasing interfacial temperature. An ITCR model, which the influence of the surface layer on the ITCR is considered, is presented for prediction the ITCR.
机译:这项研究的目的是研究氮化铝和铜之间的界面热接触电阻(ITCR)。基于在90-210 K的温度范围和0.3-1.0 MPa的接触压力范围内的一维稳态热传导来测量ITCR。我们的结果表明,氮化铝和铜之间的ITCR随着接触压力的增加和界面温度的升高而降低。提出了考虑表面层对ITCR影响的ITCR模型,以预测ITCR。

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