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PROGRESS IN THE UNDERSTANDING OF GRIDDED INERTIAL ELECTROSTATIC CONFINEMENT DEVICES AT THE UNIVERSITY OF WISCONSIN

机译:威斯康星大学对栅格化静电禁闭器件的理解研究进展

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摘要

For nearly two decades, as many as 4 Inertial Electrostatic Confinement (IEC) devices have been operated simultaneously at the University of Wisconsin-Madison. Over that time period we have learned that the early perceptions of how IEC devices operate are quite different from the actual performance in the Laboratory. Over the past 2 years we have gained even more understanding of IEC physics and technology. Experimental measurements and theoretical improvements have better characterized both the negative ions that contribute up to similar to 10% of the fusion rate in some cases and the neutral energy distributions in IEC devices at moderate pressure (0.07-0.7 Pa approximate to 0.5-5 mTorr). We also now understand more of why operation with helium plasmas has such a detrimental effect on high voltage performance of the traditional tungsten alloy grid wires. Most of the previous IEC work had been confined to < 100 kV with short operation times up to 150 kV. We have recently expanded our operating regime to approximate to 200 kV anode-cathode potential difference, which is, to our knowledge, the highest-voltage IEC operation reported in the worldwide IEC literature. Several design modifications were required to achieve steady-state operation at these high voltages and some are described in this article.
机译:近二十年来,威斯康星大学麦迪逊分校同时运行了多达4种惯性静电限制(IEC)设备。在这段时间内,我们了解到,对IEC设备的工作方式的早期认识与实验室的实际性能大不相同。在过去的两年中,我们对IEC物理和技术有了更多的了解。实验测量和理论上的改进可以更好地表征在某些情况下负离子(在某些情况下贡献至约10%的融合率)和中性压力(0.07-0.7 Pa约等于0.5-5 mTorr)在IEC设备中的中性能量分布。现在,我们还更多地了解了为何使用氦等离子体进行操作会对传统钨合金格栅线的高压性能产生如此不利的影响。先前的大多数IEC工作都被限制在<100 kV,短时间可达150 kV。最近,我们将工作范围扩大到大约200 kV阳极-阴极电势差,据我们所知,这是全球IEC文献中报道的最高电压IEC工作。为了在这些高电压下实现稳态工作,需要进行一些设计修改,并且本文中对此进行了一些描述。

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  • 来源
    《Fusion Science and Technology》 |2015年第2期|314-318|共5页
  • 作者单位

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

    Univ Wisconsin, Fus Technol Inst, Madison, WI 53706 USA;

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