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首页> 外文期刊>Fusion Engineering and Design >Integration of EPICS based monitoring for ion cyclotron high voltage power supply
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Integration of EPICS based monitoring for ion cyclotron high voltage power supply

机译:集成基于EPICS的离子回旋加速器高压电源监控

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摘要

A Dual output (27 kV & 15 kV), 3 MW Ion Cyclotron High Voltage Power Supply (IC-HVPS) has been installed and integrated with a Diacrode based RF source to be used for ICRF (Ion Cyclotron RF) system. The IC-HVPS Controller is based on LabVIEW Real-time PXI controller, which supports all control and monitoring operations of the PSM based power supply. The controller supports all essential features like, fast dynamics, low ripple and protection for source and loads.
机译:已安装双输出(27 kV和15 kV),3 MW离子回旋加速器高压电源(IC-HVPS),并与基于Diacrode的RF源集成在一起,用于ICRF(离子回旋加速器)系统。 IC-HVPS控制器基于LabVIEW Real-time PXI控制器,该控制器支持基于PSM的电源的所有控制和监视操作。该控制器支持所有基本功能,例如快速动态,低纹波以及对源和负载的保护。

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