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Light enhanced resistive switching in BaTiO3/CoFeB/BaTiO3 structure

机译:BaTiO3 / CoFeB / BaTiO3结构中的光增强电阻切换

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摘要

Obvious resistive switching is observed under light irradiation in BaTiO3/CoFeB/BaTiO3 trilayer prepared by magnetron sputtering system while the same sample shows extremely small resistive switching effect in the dark. Under the irradiation of 31.4 mW/cm(2), the ratio of high resistance to low resistance (OFF/ON ratio) of the sample annealed at 600 degrees C can keep about 80 in more than 70 test cycles without obvious decay. The current conduction mechanism is PF emission in LRS and space charge limited conduction (SCLC) in HRS. The origin of the resistive switching behavior can be explained by considering the trapping and detrapping of charges.
机译:在磁控溅射系统制备的BaTiO3 / CoFeB / BaTiO3三层中,在光照射下观察到明显的电阻切换,而同一样品在黑暗中显示出极小的电阻切换效果。在31.4 mW / cm(2)的辐射下,在600摄氏度下退火的样品的高电阻与低电阻之比(OFF / ON比)可以在70多个测试循环中保持80左右,而没有明显的衰减。电流传导机制是LRS中的PF发射和HRS中的空间电荷受限传导(SCLC)。可以通过考虑电荷的俘获和去俘获来解释电阻切换行为的起源。

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  • 来源
    《Functional materials letters》 |2016年第5期|1650052.1-1650052.4|共4页
  • 作者单位

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China;

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China|Southwest Univ, Inst Clean Energy & Adv Mat ICEAM, Chongqing 400715, Peoples R China;

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China;

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China;

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China;

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China|Southwest Univ, Inst Clean Energy & Adv Mat ICEAM, Chongqing 400715, Peoples R China;

    Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Resistive switching; multilayer film; magnetron sputtering system; memory device; light irradiation;

    机译:电阻开关;多层膜;磁控溅射系统;存储装置;光照射;

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