首页> 外文期刊>Frontiers of optoelectronics in China >Improvement of blue InGaN light-emitting diodes with gradually increased barrier heights from n- to p-layers
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Improvement of blue InGaN light-emitting diodes with gradually increased barrier heights from n- to p-layers

机译:从n层到p层的势垒高度逐渐提高的蓝色InGaN发光二极管的改进

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摘要

The advantages of blue InGaN light-emitting diodes (LED) with the active region of gradually increased barrier heights from n- to p-layers are studied. The energy band diagram, hole concentration, electrostatic field near the electron blocking layer (EBL), and the internal quantum efficiency (IQE) are investigated by Crosslight simulation program. The simulation results show that the structure with gradually increased barrier heights has better performance over the equal one, which can be attributed to the mitigated polarization effect near the interface of the last barrier/EBL due to less interface polarization charges. Moreover, reduced barrier height toward the n-layers is beneficial for holes injection and transportation in the active region. As a result, holes are injected into the active region more efficiently and distributed uniformly in the quantum wells, with which both the IQE and the total lighting power are increased. Although it can lead to the broadening of the spontaneous emission spectrum, the increase is slight such that it has little effect on the application in solid-state lighting.
机译:研究了有源区从n层到p层逐渐增加的有源区的蓝色InGaN发光二极管(LED)的优势。利用Crosslight模拟程序研究了能带图,空穴浓度,电子阻挡层(EBL)附近的静电场和内部量子效率(IQE)。仿真结果表明,势垒高度逐渐增大的结构在同等高度上具有更好的性能,这可以归因于由于较少的界面极化电荷,最后一个势垒/ EBL界面附近的极化效应有所减轻。此外,朝向n层减小的势垒高度对于在有源区中的空穴注入和传输是有利的。结果,空穴被更有效地注入到有源区中并且均匀地分布在量子阱中,由此IQE和总照明功率都增加了。尽管它可以导致自发发射光谱变宽,但增加幅度很小,因此对固态照明的应用影响很小。

著录项

  • 来源
    《Frontiers of optoelectronics in China》 |2013年第4期|429-434|共6页
  • 作者单位

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

    Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    InGaN; light-emitting diodes (LED); polariza-tion effect; gradual barrier height;

    机译:氮化镓;发光二极管(LED);极化作用逐步屏障高度;

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