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Effect of particle size and spectral sub-range within the UV-VIS-NIR range using diffuse reflectance spectra on multivariate models in evaluating the severity of fusariosis in ground wheat

机译:使用漫反射光谱在多元模型上评估地面小麦中镰刀菌病严重程度的影响,粒径和光谱子范围在UV-VIS-NIR范围内的影响

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摘要

Control (crops grown in natural conditions) and Fusarium head blight (FHB) damaged (crops inoculated with Fusarium culmorum conidia) grain of four wheat cultivars was ground and sieved into three fractions of different particle size. A series of blended samples differing in content of damaged material were prepared within fractions and cultivars, and diffuse reflectance spectra recorded within the 200-2500 nm wavelength range. Partial least-squares (PLS) models for the percentage of damaged material in blended samples were built for each of twelve series within different spectral ranges, and the root-mean-squared error of cross-validation (RMSECV) was used for the assessment of model performance. Errors using the models were lowest for the finest fraction independent of spectral range; however, their values depended on the cultivar. RMSECV for the finest fraction averaged over cultivars ranged from a little below 3.0 (when the ultraviolet light sub-range was used or participated with another one) to 8.1% (when only the near infrared (NIR) sub-range was used). For the medium and coarse fractions, averaged errors showed the same tendency of dependence on the sub-range(s); however, with higher values that increased with an increase in particle size. In conclusion, within the different fractions of particle size and spectral ranges, the most sensitive to the presence of damaged material were models developed for the finest fraction and when the ultraviolet light sub-range was used in modelling.
机译:将四个小麦品种的对照(在自然条件下生长的农作物)和镰刀枯萎病(FHB)受损(接种镰刀菌分生孢子的作物)谷物磨碎并筛分成三个不同粒径的部分。在馏分和品种中制备了一系列破坏材料含量不同的混合样品,并记录了200-2500 nm波长范围内的漫反射光谱。针对不同光谱范围内的十二个系列中的每个系列,建立了混合样品中损坏材料百分比的偏最小二乘(PLS)模型,并将交叉验证的均方根误差(RMSECV)用于评估模型性能。使用模型的误差对于与光谱范围无关的最佳分数最低。但是,它们的价值取决于品种。在各个品种上平均得到的最细部分的RMSECV范围从略低于3.0(使用紫外光子范围或与另一个子光一起参与)到8.1%(仅使用近红外(NIR)子范围)之间。对于中等和粗糙部分,平均误差表现出相同的依赖于子范围的趋势;但是,更高的值会随着粒度的增加而增加。总之,在粒径和光谱范围的不同部分中,对受损材料的存在最敏感的模型是针对最细部分开发的模型,并且在建模时使用了紫外线子范围。

著录项

  • 来源
    《Food Additives & Contaminants》 |2009年第5期|726-732|共7页
  • 作者单位

    Institute of Mathematics and Physics, University of Technology and Life Sciences, Bydgoszcz, Poland.;

    Institute of Mathematics and Physics, University of Technology and Life Sciences, Bydgoszcz, Poland.;

    Institute of Mathematics and Physics, University of Technology and Life Sciences, Bydgoszcz, Poland.;

    Institute of Mathematics and Physics, University of Technology and Life Sciences, Bydgoszcz, Poland.;

    Institute of Mathematics and Physics, University of Technology and Life Sciences, Bydgoszcz, Poland.;

  • 收录信息 美国《科学引文索引》(SCI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    fusarium head blight; scab; wheat; reflectance spectroscopy;

    机译:枯萎病痂;小麦;反射光谱;
  • 入库时间 2022-08-17 23:19:11

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