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Climate Sensitivity of Gaseous Elemental Mercury Dry Deposition to Plants: Impacts of Temperature, Light Intensity, and Plant Species

机译:气态元素汞干法沉积对植物的气候敏感性:温度,光强度和植物种类的影响

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摘要

Foliar accumulations of gaseous elemental mercury (GEM) were measured in three plant species between nominal temperatures of 10 and 30 ℃ and nominal irradiances of 0, 80, and 170 W m~(-2) (300 nm-700 nm) in a 19 m~3 controlled environment chamber. The plants exposed were as follows: White Ash (Fraxinus americana;WA); White Spruce [Picea glauca; WSk and Kentucky Bluegrass [Poa partensis; KYBG). Foliar enrichments in the mercury stable isotope (~(198)Hg) were used to measure mercury accumulation. Exposures lasted for 1 day after which the leaves were digested in hot acid and the extracted mercury was analyzed with ICPMS. Resistances to accumulative uptake by leaves were observed to be dependent on both light and temperature, reaching minima at optimal growing conditions (20 ℃; 170 W m~(-2) irradiance between 300-700 nm). Resistances typically increased at lower (10 ℃) and higher (30 ℃) temperatures and decreased with higher intensities of irradiance. Published models were modified and used to interpret the trends in stomatal and leaf interior resistances to GEM observed in WA. The model captured the experimental trends well and revealed that stomatal and internal resistances were both important across much of the temperature range. At high temperatures, however, stomatal resistance dominated due to increased water vapor pressure deficits. The resistances measured in this study were used to model foliar accumulations of GEM at a northern US deciduous forest using atmospheric mercury and climate measurements made over the 2003 growing season. The results were compared to modeled accumulations for GEM, RGM, and PHg using published deposition velocities. Predictions of foliar GEM accumulation were observed to be a factor of 5-10 lower when the temperature and irradiance dependent resistances determined in this study were used in place of previously published data. GEM uptake by leaves over the growing season was shown to be an important deposition pathway (2.3-3.7 μg m~(-2) of one-sided leaf area; OSLA) when compared to total mercury wet deposition (1.2 μg m~(-2) OSLA) and estimates of reactive mercury dry deposition (0.1 - 6μg m~(-2) OSLA). Resistance-Temperature-lrradiance relationships are provided for use in models.
机译:在19中,在标称温度为10到30℃,标称辐照度为0、80和170 W m〜(-2)(300 nm-700 nm)的三种植物中测量了气态元素汞(GEM)的叶面累积量。 m〜3可控环境室。暴露的植物如下:白灰(Fraxinus americana; WA);白云杉[Picea glauca; WSk和肯塔基早熟禾[Poa partensis; KYBG)。汞稳定同位素(〜(198)Hg)中的叶面富集用于测量汞累积。暴露持续1天,然后在热酸中消化叶片,并用ICPMS分析提取的汞。观察到叶片对累积吸收的抗性取决于光和温度,在最佳生长条件下(20℃; 170 W m〜(-2)辐照度在300-700 nm之间)达到最小值。电阻通常在较低的温度(10℃)和较高的温度(30℃)下增加,并随较高的辐照强度而降低。修改已发布的模型,并将其用于解释WA中观察到的气孔和叶片内部对GEM的抗性趋势。该模型很好地捕捉了实验趋势,并揭示了在大多数温度范围内,气孔阻力和内阻力都很重要。然而,在高温下,由于增加的水蒸气压力不足,气孔阻力占主导。在这项研究中测得的阻力被用于模拟美国北部落叶林中GEM的叶面积累,使用大气汞和2003年生长季节的气候测量结果。使用公布的沉积速度,将结果与GEM,RGM和PHg的模拟累积量进行比较。当使用这项研究中确定的温度和辐照度依赖性电阻代替以前发表的数据时,观察到叶面GEM积累的预测降低了5-10倍。与总汞湿沉降(1.2μgm〜(-)相比,生长期叶片对GEM的吸收是单侧叶区2.3-3.7μgm〜(-2); OSLA的重要沉积途径。 2)OSLA)和反应性汞干沉降的估算值(0.1-6μgm〜(-2)OSLA)。提供了电阻-温度-辐照度关系供模型使用。

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  • 来源
    《Environmental Science & Technology》 |2011年第2期|p.569-575|共7页
  • 作者单位

    Environmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States,Wisconsin State Laboratory of Hygiene, 2601 Agriculture Drive, Madison, Wisconsin 53718, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States,Wisconsin State Laboratory of Hygiene, 2601 Agriculture Drive, Madison, Wisconsin 53718, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States;

    rnWisconsin State Laboratory of Hygiene, 2601 Agriculture Drive, Madison, Wisconsin 53718, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States;

    rnEnvironmental Chemistry and Technology Program, 660 N. Park Street, Madison, Wisconsin 53705, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-17 14:03:31

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