机译:Al_2O_3对氧化石墨烯聚集与沉积的影响
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Department of Chemistry, University of Science & Technology of China, 230026, Hefei, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China;
Department of Chemistry, University of Science & Technology of China, 230026, Hefei, P.R. China;
Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, 230031, Hefei, P.R. China,Faculty of Engineering, King Abdulaziz University, Jeddah 21589, Saudi Arabia;
机译:锰锰矿化转化对石墨烯氧化物聚集及沉积的影响
机译:日光影响水生环境中氧化石墨烯的聚集和沉积
机译:La_2O_3界面层对原子层沉积沉积的Al_2O_3 / La_2O_3 / InGaAs栅叠层中InGaAs金属氧化物半导体界面性质的影响
机译:由钨灯炉中的氧化制造的4H-SiC金属 - 氧化物 - 半导体(MOS)电容器与微波血浆和随后的AL_2O_3的沉积
机译:使用基于臭氧的ALD(原子层沉积)的高K电介质沉积(氧化铝),用于石墨烯基器件。
机译:大气沉积改性氧化石墨烯蒸发辅助沉积法制备硅
机译:石墨烯单层:石墨烯氧化物的化学气相沉积修复:高导电石墨烯单层的途径(ADV。MART。46/2009)