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首页> 外文期刊>IEE Proceedings. Part H >Modelling of resistive and geometrical discontinuities in microstrip interconnections on integrated circuits
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Modelling of resistive and geometrical discontinuities in microstrip interconnections on integrated circuits

机译:集成电路微带互连中的电阻性和几何不连续性建模

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摘要

An algorithm suitable for the computer aided analysis of geometrical and resistive discontinuities present in microstrip interconnections on silicon integrated circuit substrates is presented. The distortion and dispersion of an electrical pulse, caused by such discontinuities, as it propagates along the microstrip interconnect is investigated in detail. Studies carried out to assess the use of superconducting tracks for the interconnections in integrated circuits, in the presence of modal dispersion and geometry dependent discontinuities, are also presented. The numerical results are demonstrated on realistic microstrip models for the interconnects which are selected from a practical VLSI prototype.
机译:提出了一种适合计算机辅助分析硅集成电路衬底上微带互连中存在的几何和电阻不连续性的算法。由于这种不连续性导致的电脉冲沿微带互连线传播的畸变和色散得到了详细研究。还提出了评估模态色散和几何形状不连续的集成电路中互连的超导迹线使用的研究。数值结果在从实际VLSI原型中选择的用于互连的实际微带线模型上得到了证明。

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