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The breakdown voltage of unguarded and field plate guarded silicon detector diodes

机译:无保护和场板保护的硅探测器二极管的击穿电压

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摘要

We have investigated the breakdown of 300 μm thick detector diodes by simulation and measurement. Finite ele- ment analysis reproduces the results of commonly used models in the case of conventional diodes. but demonstrates that they are inapplicable to diodes with the low bulk doping typical of detectors. The strong dependence of breakdown voltage on the magnitude of the oxide charge is quantified for unguarded diodes and for diodes with a simple field plate structure.
机译:我们已经通过仿真和测量研究了300μm厚检测器二极管的击穿。有限元分析再现了常规二极管情况下常用模型的结果。但证明它们不适用于检测器具有典型的低体积掺杂的二极管。对于无保护的二极管和具有简单场板结构的二极管,可以确定击穿电压对氧化物电荷大小的强烈依赖性。

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