High reflectivity fibre gratings produced by incubated damage using a 193 nm ArF laser

摘要

High reflectivity gratings have been formed in optical fibre using a 193 nm ArF laser irradiated phase mask. Relatively high absorption in the fibre core at this wavelength coupled with an incubation effect in which the absorption grows with repeated exposure allows rapid grating formation ( approximately 10 pulses) at modest fluences approximately 400 m Jcm/sup -2/.