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Surface-activating-bonding-based low-resistance Si/Ⅲ-Ⅴ junctions

机译:基于表面活化键的低电阻Si /Ⅲ-Ⅴ结

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摘要

The electrical properties of pn junctions, with various semiconductor materials with different doping concentrations fabricated by using surface-activated-bonding (SAB), were investigated by measuring their current-voltage (Ⅰ-Ⅴ) characteristics. The Ⅰ-Ⅴ characteristics of p~+-GaAs~(++)-Si, p~+-GaAs~+-Si, p~+-Si~+-Si, p~(++)-Si~+-InGaP, and p~+-Si~+-InGaP junctions showed ohmic-like properties. The interface resistance and the resultant electrical loss decreased with increasing impurity concentration at the interface. These results demonstrate the significance of SAB for fabricating tandem solar cells.
机译:通过测量其电流-电压(I-Ⅴ)特性,研究了具有不同掺杂浓度的各种半导体材料通过表面活化键合(SAB)制备的pn结的电学性质。 p〜+ -GaAs / n〜(++)-Si,p〜+ -GaAs / n〜+ -Si,p〜+ -Si / n〜+ -Si,p〜(++)的Ⅰ-Ⅴ特性-Si / n〜+ -InGaP和p〜+ -Si / n〜+ -InGaP结表现出类似欧姆的特性。随着界面处杂质浓度的增加,界面电阻和由此产生的电损耗降低。这些结果证明了SAB在制造串联太阳能电池中的重要性。

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  • 来源
    《Electronics Letters》 |2013年第13期|830-832|共3页
  • 作者单位

    Department of Electrical Engineering, Osaka City University, 3-3-138 Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

    Department of Electrical Engineering, Osaka City University, 3-3-138 Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

    Department of Electrical Engineering, Osaka City University, 3-3-138 Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

    Department of Electrical Engineering, Osaka City University, 3-3-138 Sugimoto,Sumiyoshi-ku, Osaka 558-8585, Japan;

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