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首页> 外文期刊>IEEE Transactions on Electron Devices >Modeling Peak Temperature in SOI-FinFET-Like Structures Considering 2-D Heat Flow
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Modeling Peak Temperature in SOI-FinFET-Like Structures Considering 2-D Heat Flow

机译:考虑到2-D热流的SOI-FinFET结构中的峰值温度

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摘要

An analytical thermal model to predict the peak temperature in silicon-on-insulator (SOI)-FinFET-like structures is proposed. The device is divided into two regions based on two separate heat flow paths and each region is analyzed and modeled independently to estimate the corresponding peak temperature. Later both the models are combined to obtain the peak temperature for the device. The temperature dependence of thermal conductivity of the semiconductor material is considered in the model. Modeling results show a high level of correlation with the 3-D COMSOL and electrothermal TCAD simulation for practical range of device dimensions and power densities. Finally, the model is validated with experimental data.
机译:提出了一种分析热模型,以预测绝缘体上硅 - 绝缘体中的峰值温度(SOI) - 菲丁状结构。该装置基于两个单独的热流路径分成两个区域,并且每个区域被独立地分析和建模以估计相应的峰值温度。后来两个模型都被组合为获得器件的峰值温度。在模型中考虑了半导体材料的热导率的温度依赖性。建模结果显示了与3-D COMSOL和电热TCAD模拟的高水平相关性,用于实际范围的设备尺寸和功率密度。最后,该模型用实验数据验证。

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