Tools feed variability data to DFM products

摘要

Synopsys has released two new tools to help developers and users of leading-edge processes better predict how proximity variations and global variations will affect circuit performance as the industry moves into 45-nm-IC manufacturing. Terry Ma, director of product marketing for Synopsys' TCAD (technology-computer-aided-design) group, says that, as the industry moves into 45-nm design, process variability will increase. To produce working silicon at that node, foundries are increasing their use of strained silicon. But the process reduction inherently adds more process variability, and the use of new materials further changes transistor characteristics. To address these issues, Synopsys has added the Seismos and Paramos tools to its Process Aware DFM (design-for-manufacturing) lineup. "Seismos and Paramos will help customers optimize their layouts and realize the full potential of technology scaling, because, if you include too many guardbands, you sacrifice performance," says Ma.