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首页> 外文期刊>Dielectrics and Electrical Insulation, IEEE Transactions on >Observation of pre-breakdown emission sites and breakdowns of vacuum gaps under short-pulsed testing
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Observation of pre-breakdown emission sites and breakdowns of vacuum gaps under short-pulsed testing

机译:在短脉冲测试下观察击穿前的发射点和真空间隙的破坏

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Emission activity of the stainless steel cathode under 200 kV, 50 to 200 ns voltage pulses was studied with the use of a 4-channel, 12-bit ICCD camera. The gap was formed by a bulk cathode and a thin-foil titanium anode. Both the cathode and anode surfaces were cleaned and polished preliminary by means of electron-beam treatment in the mode of short-time surface melting in vacuum. Observations gave a ground to tell about prebreakdown emission sites of two kinds that are stable emission sites (SES's) and unstable ones (UES's), which are different in behavior and in ability to initiate breakdowns. SES??s were recognized on the cathode at relatively low electric field strengths (at 0.55 MV/cm in average). Close to 1 MV/cm, UES's start to be recognized in images. An UES's pattern is changed from shot to shot without breakdowns. Often, breakdowns occur in spatial locations different from UES's recorded in the previous shot. The results obtained could be of interest in study of pre-breakdown and breakdown phenomena at extremely high electric fields in vacuum.
机译:使用4通道12位ICCD摄像机研究了200 kV,50至200 ns电压脉冲下不锈钢阴极的发射活性。该间隙由体阴极和薄箔钛阳极形成。阴极和阳极表面均通过电子束处理以真空中短时表面熔化的方式进行了初步清洁和抛光。观察为区分两种类型的预击穿发射点奠定了基础,两种类型的击穿前发射点是稳定发射点(SES)和不稳定发射点(UES),它们的行为和引发故障的能力不同。在相对较低的电场强度(平均为0.55 MV / cm)下在阴极上识别出SES?接近1 MV / cm,UES开始在图像中被识别。 UES的模式从一个镜头到另一个镜头而变化,没有故障。通常,击穿发生在与上次拍摄的UES不同的空间位置。获得的结果可能对研究真空中极高电场下的预击穿和击穿现象感兴趣。

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