The Antimicrobial Effect of UV-Activated Titanium Dioxide Material Deposited on Dental Implants

摘要

This work presents a pilot study on the photoelectric effect of anatase titanium dioxide (TiO2) deposited on grade 4 titanium discs on their antimicrobial properties. The focus will be especially directed towards dental implants applications. This study details specimen preparation and microstructural characterization by scanning electron microscopy, X-ray diffraction and Raman spectroscopy to ensure a homogenous coverage of the TiO2 material on the discs. The samples were further tested to highlight the photoelectric response of titanium dioxide to ultraviolet radiation in the form of electrical current within the discs. Six discs (three bare Ti, and three coated with TiO2) were seeded with a 5 μl of Escherichia coli culture. One disc of each group was subjected to the same UV light source used for the opto-electrical analysis for 0, 1 or 5 minutes. Bacteria on the discs were then harvested and incubated to examine number of viable cells. The obtained electrical properties confirmed that the surfacecoating provides simultaneous oxidation-reduction driven reactions under the photoinduced catalytic activity. This activity proves the benefits of incorporating a TiO2 layer in mitigating the number of active E-Coli bacteria in a microbial setup by as much as 21% after 5 minutes of UV exposure. This photoelectrical effect has a profound impact on the development of an insitu oral disinfectant material deposited on titanium-based dental implants. It is expected that the approach will promote facile antimicrobial treatment for patients that is non-invasive and at the same time very effective.